发明名称 Semiconductor device and method for fabricating the same
摘要 A semiconductor device includes a substrate with an insulating surface and a single crystal semiconductor layer, which is bonded to the insulating surface of the substrate. The device further includes a first insulating layer, which is provided between the insulating surface of the substrate and the single crystal semiconductor layer, and a second insulating layer, which has been deposited on the entire insulating surface of the substrate except an area in which the first insulating layer is present.
申请公布号 US2005173761(A1) 申请公布日期 2005.08.11
申请号 US20050046724 申请日期 2005.02.01
申请人 SHARP KABUSHIKI KAISHA 发明人 TAKAFUJI YUTAKA;ITOGA TAKASHI
分类号 H01L27/08;H01L21/02;H01L21/20;H01L21/316;H01L21/336;H01L21/762;H01L21/77;H01L21/84;H01L27/12;H01L29/786;H01L31/0392;(IPC1-7):H01L21/84;H01L31/039 主分类号 H01L27/08
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