| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition with which roughness is decreased and the profile of a resist pattern is improved, and also to provide a method for forming a resist pattern by using the negative resist composition. <P>SOLUTION: The negative resist composition comprises at least an alkali-soluble resin, a crosslinking agent which crosslinks with the alkali-soluble resin by the effect of an acid, and an onium salt as a photo-acid generating agent, wherein an anion moiety of the onium salt comprises a sulfonate having at least a polycyclic structure. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
