| 摘要 |
PROBLEM TO BE SOLVED: To provide ion plating equipment by an arc discharge system capable of generating a plasma by utilizing an arc discharge and stably forming ceramic films for a long time, for example,≥150 hours, on the surface of a material having a large surface area, such as, surface treatment of a steel sheet or structural material by ion plating. SOLUTION: The ion plating equipment of the arc discharge system is provided with at least one deposition particle evaporation source within a vacuum chamber, evaporates deposition particles from the evaporation source by the arc discharge, ionizes the particles in the plasma, and allows the ionized deposition particles to adhere to a coating object in the vacuum chamber by accelerating the deposition particles. The evaporation source for the deposition particles is so constituted that the arc discharge region thereof can be renewed in a horizontal direction. COPYRIGHT: (C)2005,JPO&NCIPI
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