发明名称 Semiconductor element and its manufacturing method
摘要 In a semiconductor element comprising microcrystalline semiconductor, a semiconductor junction is provided within a microcrystal grain. Further, in a semiconductor element comprising microcrystalline semiconductor, providing microcrystal grains of different grain diameters as a mixture to form a semiconductor layer. Thereby, discontinuity of a semiconductor junction is improved to improve the characteristics, durability, and heat resisting properties of a semiconductor element. Distortion in a semiconductor layer is also reduced.
申请公布号 US2005173704(A1) 申请公布日期 2005.08.11
申请号 US20030625672 申请日期 2003.07.24
申请人 CANON KABUSHIKI KAISHA 发明人 SAITO KEISHI;SANO MASAFUMI
分类号 H01L31/0368;H01L31/052;H01L31/075;H01L31/076;H01L31/20;(IPC1-7):H01L29/04 主分类号 H01L31/0368
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