| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system with which efficient cleaning can be performed in spite of upsizing of a substrate supporting section for supporting a substrate and a film deposition chamber by accompanying upsizing of the substrate and a cleaning method therefor. SOLUTION: The film deposition system 30 is equipped with the film deposition chamber 10, the substrate supporting section 3a of an approximately square shape which is disposed in the film deposition chamber 10, a shower plate 5 which is disposed to face the substrate supporting section 3a and has a number of small holes for introducing the film deposition gas into the film deposition chamber 10, at least four cleaning gas introducing pipes 23a to 23d which have gas introducing ports 20a to 20d communicatively connected directly into the film deposition chamber 10 without through the shower plate 5 and of which the respective gas introducing ports 20a to 20d are respectively directed to the four corners A to D of the substrate supporting section 3a, and radical generation sources 21a to 21d which are disposed on the outside of the film deposition chamber 10 and are connected to the respective cleaning gas introducing pipes 23a to 23d. COPYRIGHT: (C)2005,JPO&NCIPI
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