| 摘要 |
The present invention discloses a photosensitive resin composition for black matrix, which shows high photosensitivity and forms a pattern with good smoothness of edge, high resolution, no undercut and free of peeling after development. The photosensitive resin composition comprises (A) an alkali-soluble resin, (B) a photopolymerizable monomer, (C) a photoinitiator having a general formula (c-1), (D) a solvent, and (E) a black pigment; wherein the alkali-soluble resin (A) comprises a functional group having a general formula (a-1); (Each R is independently H, linear or branch alkyl of C1-C5, phenyl, or halogen.) (Z<SUB>1 </SUB>is selected from the group consisting of Ra, Rb-S, Rc-O, wherein each of Ra, Rb, Rc is independently H, alkyl or aryl; Z<SUB>2 </SUB>is H, alkyl of C1-C4, or halide.)
|
