发明名称 Controlled growth of gallium nitride nanostructures
摘要 A transition metal substituted, amorphous mesoporous silica framework with a high degree of structural order and a narrow pore diameter distribution (±0.15 nm FWHM) was synthesized and used for the templated growth of GaN nanostructures, such as single wall nanotubes, nanopipes and nanowires. The physical properties of the GaN nanostructures (diameter, diameter distribution, electronic characteristic) can be controlled by the template pore diameter and the pore wall chemistry. GaN nanostructures can find applications, for example, in nanoscale electronic devices, such as field-emitters, and in chemical sensors.
申请公布号 US2005176249(A1) 申请公布日期 2005.08.11
申请号 US20040011629 申请日期 2004.12.13
申请人 PFEFFERLE LISA;CIUPARU DRAGOS;HAN JUNG;HALLER GARY 发明人 PFEFFERLE LISA;CIUPARU DRAGOS;HAN JUNG;HALLER GARY
分类号 C01B21/06;C23C16/04;C23C16/30;C30B25/00;C30B25/02;C30B29/40;C30B29/60;H01L21/302;H01L21/461;(IPC1-7):H01L21/302 主分类号 C01B21/06
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