| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for diminishing the metal content in a surfactant preferably to ppb levels enough to be usable in high-performance semiconductor materials, and to provide an apparatus for the method. SOLUTION: The method for removing metal compounds in a surfactant comprises using a combination of an ion exchange resin, a functional filter and a constituent member of specific material property and making the combination contact with the surfactant. The apparatus for this method is such that an ion exchange-packed column and a functional filter unit are joined to each other via the constituent member of specific material property. Thus, the metal content in the surfactant can be diminished to levels preferably lower than 5 ppb. COPYRIGHT: (C)2005,JPO&NCIPI
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