发明名称 VAPOUR DEPOSITION FILM
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film for holding high optical density/barrier properties and appearance beautifullness with respect to acidic content. SOLUTION: A copper vapor deposition layer of 5-20 ng/cm<SP>2</SP>is formed at least on one side of a plastic film base material and an aluminum vapor deposition layer is subsequently formed on the copper vapor deposition layer. Further, a coating layer with a thickness of 0.5-2.5μm formed by the reaction of a resin and a curing agent is formed on the aluminum vapor deposition layer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005212243(A) 申请公布日期 2005.08.11
申请号 JP20040020851 申请日期 2004.01.29
申请人 TORAY ADVANCED FILM CO LTD 发明人 SUGIMOTO HIROSHI;TERANISHI MASAYOSHI
分类号 B32B15/08;(IPC1-7):B32B15/08 主分类号 B32B15/08
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