| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for modeling a photolithography process, a computer program product, and a system for modeling a photolithography process. <P>SOLUTION: The method for modeling a photolithography process comprises a step for creating a calibration model of a photolithography process capable of predicting an image being created by the photolithography process when it is utilized for imaging a mask pattern provided with a plurality of features, and a step for determining the operation window of a calibration model deciding whether an image created by a given feature in a mask pattern can be predicted accurately by the calibration model or not. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
