发明名称 METHOD AND DEVICE FOR SUPPORTING PLATE MEMBER, STAGE DEVICE, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE
摘要 <p>A method and a device for supporting a plate member capable of suppressing the deterioration of the surface accuracy of the plate member due to its deformation when the plate member for which high flatness is requested is fixed to a pedestal on a substrate stage. The plate member supporting device (10) comprises the plate member (1) on which an area (AR) having a specified surface accuracy is formed and the pedestal (2) supporting the plate member (1). Only one end part (1a) of the plate member (1) is fixedly supported on the pedestal (2).</p>
申请公布号 WO2005074015(A1) 申请公布日期 2005.08.11
申请号 WO2005JP01224 申请日期 2005.01.28
申请人 NIKON CORPORATION;ONO, KAZUYA;ASHIDA, KENICHI;MUKAIDE, KOUE 发明人 ONO, KAZUYA;ASHIDA, KENICHI;MUKAIDE, KOUE
分类号 G03F7/20;G12B5/00;(IPC1-7):H01L21/027;H01L21/68;G02B7/198;G03F9/02 主分类号 G03F7/20
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