| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for creating a model simulating the image formation performance of a plurality of aligners. <P>SOLUTION: The inventive method comprises a step for creating a model calibrated for a first aligner including a first set of basic functions and capable of estimating an image being created by the first aligner with regard to a given photolithography process, a step for creating a model of a second aligner including a second set of basic functions and capable of estimating an image being created by the second aligner with regard to that photolithography process, and a step for creating an equivalent model function corresponding to the second aligner by representing a second set of basic functions as a primary combination of the first set of basic functions. The equivalent model function creates a simulation image corresponding to an image being created by the second aligner with regard to that photolithography process. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
