发明名称 Treatment condition decision method, treatment condition decision system, treatment system, treatment condition decision calculator program, program recording medium, and semiconductor device manufacturing method
摘要 In step S11, quantities that are varied (parameters) are respectively varied in a stepwise manner at a specified pitch, and standard working conditions consisting of combinations of these parameters are determined. For all of the standard working conditions, a working is actually performed, and the treated shapes that are obtained as a result are taken as the standard treated shapes for the respective standard working conditions (step S12). In cases where an appropriate simulation program is available, the standard treated shapes may be determined by simulation without actually performing a working. The standard working conditions and standard treated shapes thus determined are stored in a memory device. When the desired shape that is to be obtained by working is given in step S13, a standard treated shape that is close to the desired shape is sought in step S14. Thus, when a treated shape is given, the working conditions for this treated shape can be determined.
申请公布号 US2005176348(A1) 申请公布日期 2005.08.11
申请号 US20040924201 申请日期 2004.08.24
申请人 NIKON CORPORATION 发明人 SENGA TATSUYA;USHIO YOSHIJIRO
分类号 B24B37/04;B24B49/00;H01L21/3105;H01L21/321;H01L21/768;(IPC1-7):B24B49/00 主分类号 B24B37/04
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