发明名称 METHOD OF LIFTING SILICON SINGLE CRYSTAL
摘要 <p>[PROBLEMS] To produce a silicon single crystal ingot free from point-defect aggregate over almost its entire length without decreasing pure margin. [MEANS OF SOLVING PROBLEMS] A heat shielding member (36) is provided with a bulging unit (41) provided at the lower part of a tube part (37) to swell in the inner side of the tube part and having a heat storing member (47) provided inside thereof. An silicon single crystal ingot (25) is lifted such that the flow rate of an inert gas flowing down between the bulging unit (41) at the heat shielding member (36) and the ingot (25) when a top-side ingot (25a) of the silicon single crystal ingot (25) is lifted is larger than the flow rate of an inert gas flowing down between the bulging unit (41) and the ingot (25) when a bottom-side ingot (25b) of the silicon single crystal ingot (25) is lifted. Alternatively, the intensity of a cusp magnetic field (53) when the top-side ingot (25a) is lifted is set larger than that of the cusp magnetic field (53) when the bottom-side ingot (25b) is lifted.</p>
申请公布号 WO2005073440(A1) 申请公布日期 2005.08.11
申请号 WO2005JP00882 申请日期 2005.01.25
申请人 SUMITOMO MITSUBISHI SILICON CORPORATION;HARADA, KAZUHIRO;FUKATSU, NORIHITO;FU, SENLIN;SUZKI, YOJI 发明人 HARADA, KAZUHIRO;FUKATSU, NORIHITO;FU, SENLIN;SUZKI, YOJI
分类号 C30B15/00;C30B15/14;C30B15/30;C30B29/06;C30B35/00;(IPC1-7):C30B29/06 主分类号 C30B15/00
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