发明名称 |
NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN |
摘要 |
<p>Disclosed is a negative resist composition which enables to form a resist pattern with improved shape properties by reducing roughness. Also disclosed is a method for forming a resist pattern using such a negative resist composition. The negative resist composition contains at least an alkali-soluble resin, a crosslinking agent which is crosslinked with the alkali-soluble resin by the action of an acid, and an onium salt as a photoacid generator. The anion component of the onium salt is composed of at least a sulfonate having a polycyclic structure.</p> |
申请公布号 |
WO2005073810(A1) |
申请公布日期 |
2005.08.11 |
申请号 |
WO2005JP00879 |
申请日期 |
2005.01.24 |
申请人 |
TOKYO OHKA KOGYO CO., LTD.;KANEKO, FUMITAKE;TACHIKAWA, TOSHIKAZU |
发明人 |
KANEKO, FUMITAKE;TACHIKAWA, TOSHIKAZU |
分类号 |
G03F7/038;G03F7/004;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/038 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|