发明名称 NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
摘要 <p>Disclosed is a negative resist composition which enables to form a resist pattern with improved shape properties by reducing roughness. Also disclosed is a method for forming a resist pattern using such a negative resist composition. The negative resist composition contains at least an alkali-soluble resin, a crosslinking agent which is crosslinked with the alkali-soluble resin by the action of an acid, and an onium salt as a photoacid generator. The anion component of the onium salt is composed of at least a sulfonate having a polycyclic structure.</p>
申请公布号 WO2005073810(A1) 申请公布日期 2005.08.11
申请号 WO2005JP00879 申请日期 2005.01.24
申请人 TOKYO OHKA KOGYO CO., LTD.;KANEKO, FUMITAKE;TACHIKAWA, TOSHIKAZU 发明人 KANEKO, FUMITAKE;TACHIKAWA, TOSHIKAZU
分类号 G03F7/038;G03F7/004;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/038
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