发明名称 METHOD AND EQUIPMENT FOR EXPOSING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To shorten the transition time from some sample shot processing to next sample shot processing, and the transition time from sample shot processing to exposure processing. SOLUTION: Processing order of sample shot of global alignment is determined to shorten the stage movement distance from the last shot of global alignment to the first shot of exposure. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005217092(A) 申请公布日期 2005.08.11
申请号 JP20040020723 申请日期 2004.01.29
申请人 CANON INC 发明人 KATAYAMA HISASHI
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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