| 摘要 |
PROBLEM TO BE SOLVED: To provide a simpler lithographic apparatus which can image a pattern larger than an exposure field. SOLUTION: A lithographic apparatus has a mask table which is designed to hold a mask at two or more positions. Firstly, exposure is performed by using the mask at a first position. Next, secondary exposure is performed by using the mask at a second position. This allows a mask having a pattern region larger than the exposure field to be imaged. COPYRIGHT: (C)2005,JPO&NCIPI
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