发明名称 Method and apparatus for forming a pattern, device and electronic apparatus
摘要 A method for forming a pattern on a substrate, including the steps of: ejecting liquid drops from an ejection head having nozzles onto a reference plate on which a plurality of target positions are defined, the target positions being arranged in at least one row; detecting an amount of a displacement between the target positions and the positions at which the liquid drops have actually landed; determining a relative positional error relative to the ejection head for each of the at least one row of the target positions based on the amount of the displacement; determining a correction value for each of the at least one row based on the relative positional error; and sequentially changing a relative position of the substrate and the ejection head based on the corrections values when the liquid drops are being ejected onto the substrate.
申请公布号 US2005177343(A1) 申请公布日期 2005.08.11
申请号 US20040027921 申请日期 2004.12.30
申请人 NAGAE NOBUAKI 发明人 NAGAE NOBUAKI
分类号 H04R9/02;B05C5/00;B05C11/00;B05D3/00;B05D7/00;B29C65/52;B41J2/01;G06F11/30;H01L21/027;H01L51/50;H04R1/06;H04R9/06;H04R31/00;H05B33/10;H05B33/14;(IPC1-7):G06F11/30 主分类号 H04R9/02
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