| 摘要 |
A projection exposure apparatus which has a projection optical system (4) and projects a pattern onto a substrate (2) through the projection optical system (4) is disclosed. This apparatus includes a sensor unit (27) which comprises a light-receiving element (23) for detecting light incident through the projection system (4), a vessel (22) in which the light-receiving element (23) is arranged, and a sealing window (21) which transmits the incident light and seals the vessel (22). A space between the sealing window (21) and the light-receiving element (23) is filled with a medium (24) having a refractive index greater than 1.
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