发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
A semiconductor device using a low-dielectric-constant film whose dielectric constant k is 3.0 or lower for an interlayer film (14) includes a suppression mechanism unit (20) that suppresses film peeling of the interlayer film (14). <IMAGE> |
申请公布号 |
EP1562227(A1) |
申请公布日期 |
2005.08.10 |
申请号 |
EP20030772778 |
申请日期 |
2003.11.14 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TAMURA, ITARU,;MURAKAMI, KATSUYA;TAKEBE, NAOTO |
分类号 |
H01L21/768;H01L21/3205;H01L21/82;H01L21/822;H01L23/52;H01L23/522;H01L23/58;H01L27/04 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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