发明名称 Werkwijze en inrichting voor het elektrolytisch doen toenemen van de dikte van een elektrisch geleidend patroon op een dielektrische drager alsmede dielektrische drager.
摘要 The invention provides a method for electrolytically increasing the thickness of an electrically conductive pattern on a dielectric substrate, comprising the steps of immersing the substrate with the pattern present thereon in an electrolytic bath, electrically contacting in the electrolytic bath a negatively charged electrode with the pattern during immersion of the substrate, and effecting contacting movement in the electrolytic bath of the electrode and the pattern with respect to each other during immersion of the substrate. <??>The invention furthermore provides a device for electrolytically increasing the thickness of an electrically conductive pattern on a dielectric substrate. <IMAGE>
申请公布号 NL1025446(C2) 申请公布日期 2005.08.10
申请号 NL20041025446 申请日期 2004.02.09
申请人 BESI PLATING B.V. 发明人 PETER JACOBUS GERARDUS LOERMANS;AUGUSTINUS CORNELIS MARIA VAN DE VEN
分类号 C25D5/02;C25D5/04;C25D7/00;C25D7/06;C25D21/00;H05K1/00;H05K3/18;H05K3/24 主分类号 C25D5/02
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