发明名称 Holographic illuminator for synchrotron-based projection lithography systems
摘要 The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (1) a synchrotron source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence, (2) a holographic diffuser having a surface that receives incident radiation from said source, (3) means for translating the surface of the holographic diffuser in two dimensions along a plane that is parallel to the surface of the holographic diffuser wherein the rate of the motion is fast relative to integration time of said image processing system; and (4) a condenser optic that re-images the surface of the holographic diffuser to the entrance plane of said image processing system.
申请公布号 US6927887(B2) 申请公布日期 2005.08.09
申请号 US20010981500 申请日期 2001.10.16
申请人 EUV LLC 发明人 NAULLEAU PATRICK P.
分类号 G02B5/32;G03F7/20;(IPC1-7):G02B5/32 主分类号 G02B5/32
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