发明名称 Illumination system that suppresses debris from a light source
摘要 There is provided an illumination system for wavelengths of <=193 nm. The illumination system includes an object plane, a plane conjugated to the object plane, a first collector between the object plane and the conjugated plane, and a second collector after the conjugated plane. The first collector focuses a beam bundle of rays from the object plane in the conjugated plane. At least one of the first and second collectors includes a mirror shell. The rays strike the mirror shell at an angle of incidence of less than 20° relative to a surface tangent of the mirror shell.
申请公布号 US6927403(B2) 申请公布日期 2005.08.09
申请号 US20020216547 申请日期 2002.08.09
申请人 ASML LITHOGRAPHY B.V. 发明人 SINGER WOLFGANG;ANTONI MARTIN;WANGLER JOHANNES;EGLE WILHELM;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF
分类号 G02B5/08;G02B5/10;G02B17/00;G02B27/18;G03F7/20;H01L21/027;(IPC1-7):G01N21/64 主分类号 G02B5/08
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