| 摘要 |
A self-cleaning appliance, e.g., an oven, is provided herein. Such appliance comprises one having at least one surface over which organic contaminants are expected to accumulate and a photocatalytically-activated, self-cleaning coating of photocatalytically-activated, self-cleaning oxides which are essentially free of a binder, such oxides are formed on the at least one surface from sol-gel giving a photocatalytically- activated, self-cleaning coating from photocatalytically-activated oxides with a thickness within the range of about 200 to 5000 Angstroms, or from spray pyrolysis, chemical vapour deposition, or magnetron sputtering vacuum deposition over said surface. Then, the appliance is rendered self-cleaning of accumulated organic contaminants on one or more surfaces of the appliance, by coating such surfaces of the appliance with a photocatalytically-activated self-cleaning coating. Upon exposing such coated surfaces to radiation of the appropriate wavelength, for a sufficient interval of time, at least a portion of the organic contaminants present on the photocatalytically-activated self-cleaning coating are removed. The coated surface is thereby cleaned without the need of manual effort or high temperatures. The radiation is generally actinic radiation, and more particularly includesultraviolet radiation.
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