发明名称 Electron beam apparatus and spacer for reducing electrostatic charge
摘要 An electron beam apparatus including a hermetic container provided with an electron source, in which, when a first member is arranged in the hermetic container, at least part of the first member is coated with a film, and the film is configured in such a manner that it includes two regions, a first region and a second region different in electron density from the first region and the second region forms a network in the first region. This three-dimensional network structure allows a member being charged to be preferably controlled. Thereby, it is possible to control the effects of a member being charged which is used in an electron beam apparatus.
申请公布号 US6927533(B1) 申请公布日期 2005.08.09
申请号 US19990413773 申请日期 1999.10.07
申请人 CANON KABUSHIKI KAISHA 发明人 ITO NOBUHIRO;MITSUTAKE HIDEAKI
分类号 H01J9/24;H01J5/03;H01J29/02;H01J29/86;H01J29/87;H01J31/12;(IPC1-7):H01J1/62;H01J63/04;H01J19/42 主分类号 H01J9/24
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