发明名称 Plurality of capacitors employing holding layer patterns and a method of fabricating the same
摘要 A plurality of capacitors employing holding layer patterns, and a method of fabricating the same, the plurality of capacitors including a plurality of cylinder-shaped lower plates repeatedly aligned in two dimensions. Holding layer patterns are located between the uppermost portions and the lowermost portions of the plurality of lower plates, and connect the adjacent side walls of the plurality of lower plates. An upper plate fills the spaces inside the plurality of lower plates and the spaces between the side walls of the plurality of lower plates. A capacitor dielectric layer is interposed between the plurality of lower plates and the upper plate, and insulates the lower plates and the upper plate.
申请公布号 KR100506944(B1) 申请公布日期 2005.08.05
申请号 KR20030077414 申请日期 2003.11.03
申请人 发明人
分类号 H01L21/8242;H01L21/02;H01L27/02;H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L21/8242
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