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发明名称
Slurry Composition for Chemical Mechanical Polishing of Metal with Improved Evenness
摘要
申请公布号
KR100504607(B1)
申请公布日期
2005.08.03
申请号
KR20020085259
申请日期
2002.12.27
申请人
发明人
分类号
C09K3/14;(IPC1-7):C09K3/14
主分类号
C09K3/14
代理机构
代理人
主权项
地址
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