| 摘要 |
<p>An inorganic oxide deposition layer and a gas barrier coating layer are sequentially formed on a base. The gas barrier coating layer is formed by applying a coating liquid onto the inorganic oxide deposition layer and drying it. The coating liquid contains a substance expressed by the general formula (1): Si(OR1)4 or a hydrolysate thereof, a substance expressed by the general formula (2): (R2Si(OR3)3)n or a hydrolysate thereof, (in the general formulae (1) and (2), R1 and R3 respectively represent CH3, C2H5, or C2H4OCH3, and R2 represents an organic functional group), and a water-soluble polymer having a hydroxyl group.</p> |
