发明名称 |
Computer aided modeling, reliability checking and verification of a lithography process using a calibrated eigen decomposition model |
摘要 |
A method for modeling a photolithography process which includes the steps of generating a calibrated model of the photolithography process capable of estimating an image to be produced by the photolithography process when utilized to image a mask pattern containing a plurality features; and determining an operational window of the calibrated model, which defines whether or not the calibrated model can accurately estimate the image to be produced by a given feature in the mask pattern. |
申请公布号 |
EP1560072(A2) |
申请公布日期 |
2005.08.03 |
申请号 |
EP20050250491 |
申请日期 |
2005.01.31 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
SHI, XUELONG;CHEN, JANG FUNG |
分类号 |
G03F7/20;G03F1/00;G03F1/36;G03F1/44;G03F1/70;G06F17/50;G06K9/00;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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