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发明名称
Method for manufacturing ruthenium layer and method for metal-insulator-metal capacitor using the same
摘要
申请公布号
KR100505674(B1)
申请公布日期
2005.08.03
申请号
KR20030012044
申请日期
2003.02.26
申请人
发明人
分类号
H01L21/205;C23C16/18;H01L21/02;H01L21/285;H01L21/8242;H01L21/8246;(IPC1-7):H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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