发明名称 |
Method and apparatus for film thickness measurement |
摘要 |
<p>The thickness of a thin film (14) can be measured based on the X-ray diffraction method. An X-ray (16) is allowed to be incident upon a surface of the thin film (14). An intensity of a diffracted X-ray (20) is measured with the incident angle ± being changed to obtain a measured rocking curve. On the other hand, a theoretical rocking curve is calculated in consideration of an orientation density distribution function Á of the thin film (14). A scale factor is predetermined for a standard sample having a known film thickness. A parameter fitting operation is carried out in a manner that the characteristic parameter of the function Á and the film thickness t are adjusted so that the theoretical rocking curve including the scale factor can approach the measured rocking curve as closely as possible.</p> |
申请公布号 |
EP1559993(A2) |
申请公布日期 |
2005.08.03 |
申请号 |
EP20050001701 |
申请日期 |
2005.01.27 |
申请人 |
RIGAKU CORPORATION |
发明人 |
OMOTE, KAZUHIKO;HIMEDA, AKIHIRO |
分类号 |
G01N23/20;G01B15/02;(IPC1-7):G01B15/02 |
主分类号 |
G01N23/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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