发明名称 Method and apparatus for film thickness measurement
摘要 <p>The thickness of a thin film (14) can be measured based on the X-ray diffraction method. An X-ray (16) is allowed to be incident upon a surface of the thin film (14). An intensity of a diffracted X-ray (20) is measured with the incident angle ± being changed to obtain a measured rocking curve. On the other hand, a theoretical rocking curve is calculated in consideration of an orientation density distribution function Á of the thin film (14). A scale factor is predetermined for a standard sample having a known film thickness. A parameter fitting operation is carried out in a manner that the characteristic parameter of the function Á and the film thickness t are adjusted so that the theoretical rocking curve including the scale factor can approach the measured rocking curve as closely as possible.</p>
申请公布号 EP1559993(A2) 申请公布日期 2005.08.03
申请号 EP20050001701 申请日期 2005.01.27
申请人 RIGAKU CORPORATION 发明人 OMOTE, KAZUHIKO;HIMEDA, AKIHIRO
分类号 G01N23/20;G01B15/02;(IPC1-7):G01B15/02 主分类号 G01N23/20
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