发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
Pre-cleaning or in situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating the optical component with microwave and/or infra-red radiation, preferably infra-red radiation having a wavelength or a range of wavelengths in the range of from 1000 cm<SUP>-1 </SUP>to 4600 cm<SUP>-1</SUP>. This technique may be suitable for cleaning a mask. By monitoring the absorption of microwave and/or infra-red radiation directed at a contaminated optical component, the degree of contamination of said component can be qualified. This method may also be suitable for reducing the partial pressure of water in EUV apparatus.
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申请公布号 |
US6924492(B2) |
申请公布日期 |
2005.08.02 |
申请号 |
US20010021296 |
申请日期 |
2001.12.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN SCHAIK WILLEM |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):A61N5/00;G21G5/00;G21K5/10 |
主分类号 |
G03F7/20 |
代理机构 |
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地址 |
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