发明名称 |
Photocurable composition, process for producing photocurable resin, and crosslinked product |
摘要 |
A photocurable composition is provided which yields an excellent tack-free, hard cured product without any addition of photoinitiators. A photocurable composition which is excellent in storage stability is also provided. The photocurable composition contains a resin having an acryloyl group and a chemical structure element selected from the group consisting of beta-diketone groups and beta-ketoester groups, wherein the beta-diketone group or the beta-ketoester group has a tetra-substituted carbon atom between two carbonyl groups, which is capable of generating one or two free radicals under photoirradiation, and the photocurable composition does not increase more than 25% in viscosity when heated at 60° C. for 5 days.
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申请公布号 |
US6924324(B2) |
申请公布日期 |
2005.08.02 |
申请号 |
US20030382999 |
申请日期 |
2003.03.07 |
申请人 |
DAINIPPON INK AND CHEMICALS, INC. |
发明人 |
GAUDL KAI-UWE;LACHOWICZ ARTUR;YATSUGI KEN-ICHI;GRAHE GERWALD F. |
分类号 |
C08F2/46;C08F222/10;C08F290/06;C08F299/02;C08G61/12;(IPC1-7):C08F2/46 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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