发明名称 Process for sealing devices incorporating microstructures
摘要 A process for the fabrication of devices that integrate protected microstructures, comprising the following steps: forming, in a body of semiconductor material, at least one microstructure having at least one first portion and one second portion which are relatively mobile with respect to one another and are separated from one another by at least one gap region, which is accessible through a face of the body; and sealing the gap. The sealing step includes depositing on the face of the body a layer of protective material, in such a way as to close the gap region, the protective layer being such as to enable relative motion between the first portion and the second portion of the microstructure.
申请公布号 US6924166(B2) 申请公布日期 2005.08.02
申请号 US20020293980 申请日期 2002.11.12
申请人 STMICROELECTRONICS S.R.L. 发明人 SASSOLINI SIMONE;DEL SARTO MARCO;FREZZA GIOVANNI;BALDO LORENZO
分类号 B81B7/00;B81C1/00;(IPC1-7):H01L21/00 主分类号 B81B7/00
代理机构 代理人
主权项
地址