发明名称 |
Developing photoresist with supercritical fluid and developer |
摘要 |
A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
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申请公布号 |
US6924086(B1) |
申请公布日期 |
2005.08.02 |
申请号 |
US20030367078 |
申请日期 |
2003.02.14 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ARENA-FOSTER CHANTAL J.;AWTREY ALLAN WENDELL;RYZA NICHOLAS ALAN;SCHILLING PAUL |
分类号 |
B05D3/02;G03C5/26;G03F7/30;(IPC1-7):G03F7/30 |
主分类号 |
B05D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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