发明名称 Liquid preparation system is for pre-treatment in such liquids of impurities containing minimum particles treatable by a successive filtration apparatus
摘要 <p>The liquid preparation system is for pre-treatment in such liquids of impurities containing minimum particles treatable by a successive filtration apparatus. The system contains several chambers (3,8,10,15,18), in which the liquid is exposed in succession to:- a high frequency electric field to ionize non-metal particles contained in the impurities; a first magnetic field to charge negatively metallic particles; a second magnetic field for temporary union between metallic and non-metallic particles; a process of flocculation for the definite union of the particles in floccules of dimensions treatable by the filtration apparatus.</p>
申请公布号 CH694806(A5) 申请公布日期 2005.07.29
申请号 CH20010000504 申请日期 2001.03.20
申请人 ROLAND HUBER 发明人 HUBER ROLAND
分类号 B03C1/02;C02F1/00;C02F1/48;C02F1/52;C02F9/00;(IPC1-7):C02F1/48 主分类号 B03C1/02
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