| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus through the inspection hole of which a vapor deposition source or a substrate to be vapor deposited placed in a vapor deposition tank can be observed, without cleaning the inspection hole for a long period, to provide a method for manufacturing an electrooptical device, and to provide electronic equipment. SOLUTION: This vapor deposition apparatus comprises: a vapor deposition tank 11; a inspection hole 13 of a window for inspecting the vapor deposition source 12 placed in the vapor deposition tank 11 from outside the vapor deposition tank 11 therethrough; a deposition shield 16 of a deposition-preventing means placed on a straight line between the vapor deposition source 12 and the inspection hole 13; and a mirror 15 for reflecting a light 3 emitted from the vapor deposition source 12 toward the inspection hole 13. COPYRIGHT: (C)2005,JPO&NCIPI
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