发明名称 |
METHOD OF FORMING MASK PATTERN ON SUBSTRATE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of forming a two-dimensional mask pattern on a substrate. <P>SOLUTION: The method of forming the two-dimensional mask pattern on the substrate (1) comprises (a) printing a non-electrically conductive material (2) on the substrate in a coarse version of the required mask patterns (3A to 3D) and (b) selectively ablating a portion (3B) of the material using a laser to refine the coarse pattern to form the desired mask pattern. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005202412(A) |
申请公布日期 |
2005.07.28 |
申请号 |
JP20050009325 |
申请日期 |
2005.01.17 |
申请人 |
FUJIFILM ELECTRONIC IMAGING LTD |
发明人 |
BITTNER CHRISTOPH;GOUCH MARTIN PHILIP;BROMLEY NIGEL INGRAM |
分类号 |
G03F1/08;H05K3/00;H05K3/04;H05K3/06;H05K3/12;H05K3/28;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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