| 摘要 |
PROBLEM TO BE SOLVED: To provide a spherical aberration measuring pattern and a measuring method which measures line ends of a plurality of pattern sizes and pitches at once. SOLUTION: The spherical aberration measuring pattern has a repetitive pattern 100 composed of a plurality of line patterns formed in parallel at fixed pitches and another repetitive pattern 101 composed of a plurality of line patterns formed in parallel at different pitches, and each line pattern has a shape tapered toward the end. They are laid so that those line patterns located near the centers of the repetitive patterns 100, 101 line up on a straight line. The measuring method changes the focal position to form a plurality of measuring patterns different in pattern retrogression length, and measures the pattern retrogression length to find an optimum focal position. COPYRIGHT: (C)2005,JPO&NCIPI |
