| 摘要 |
<p>Objects of the invention are to provide a novel vapor deposition material for coating from which a thermal barrier coating film excellent in heat resistance and thermal shock resistance can be satisfactorily formed even by the EB-PVD method, and to provide a method of vapor deposition in which the vapor deposition material is used. The vapor deposition material comprises a zirconia sintered body containing a stabilizer, wherein the sintered body has a content of monoclinic crystals of from 25 to 90% and has a maximum thermal expansion ratio not exceeding 6x10<-3> based on room temperature when heated in the temperature range of from room temperature to 1,200 DEG C. This zirconia sintered body preferably has a tapped density of from 3.0 to 5.5 g/cm<3>, a porosity of from 5 to 50%, and a mode size of pores of from 0.3 to 10 mu m, and in the sintered body the volume of pores of from 0.1 to 10 mu m preferably accounts for at least 90% of the total pore volume. The vapor deposition method uses this vapor deposition material. <IMAGE></p> |
