| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target or the like to deposit an optical semi-permeable film containing metal and silicon in which particles, foreign matters and defects are less liable to generate even when the target is continuously used for sputtering. <P>SOLUTION: The sputtering target deposits an optical semi-permeable film containing at least metal and silicon on a translucent substrate. The sputtering target consists substantially of metal and silicon, and silicon is contained more than the stoichiometrically stable composition of the metal and silicon, and is present as metal silicide particles and silicon particles. The grain size and/or the granularity distribution of the metal silicide particles are set so that the defect generation ratio of the optical semi-permeable film is equal to or less than a predetermined value. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
