发明名称 PHOTOSENSITIVE ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive element excellent in roughness of lateral faces of a resist pattern, flatness of the top surface of the pattern, resolution, adhesion and alkali developability. SOLUTION: The photosensitive element comprises a biaxially oriented polyester film, a resin layer containing fine particles formed on one surface of the polyester film, and a layer of a photosensitive resin composition on the opposite surface of the polyester film, wherein an angle (°) of contact of a support film including the resin layer containing the fine particles to water satisfies the formula (1): (angle of contact of X surface)/(angle of contact of Y surface)>1.1 (where X surface is a surface on which the photosensitive resin composition is applied and dried; and Y surface is a surface on which the resin layer containing the fine particles is formed), and the photosensitive resin composition comprises (A) a binder polymer having a carboxyl group, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photopolymerization initiator. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005202399(A) 申请公布日期 2005.07.28
申请号 JP20050003706 申请日期 2005.01.11
申请人 HITACHI CHEM CO LTD 发明人 CHIBA TATSUO;ICHIKAWA TATSUYA
分类号 G03F7/09;G03F7/004;G03F7/027;G03F7/028;H05K3/00 主分类号 G03F7/09
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