发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of efficiently manufacturing a semiconductor device with a thin sheet type semiconductor wafer accompanied by plating treatment as a base in such a manner that the failure of the thin sheet type wafer in the plating treatment is evaded. SOLUTION: The method of manufacturing each semiconductor device (10) provided with a plating layer (6) comprises: a step where a semiconductor wafer (5) in which a plurality of circuit patterns (2, 4) of the semiconductor device (10) are arranged on at least either side is prepared; a step where the wafer (5) is diced into a plurality of chips (10) each provided with the prescribed circuit patterns; and a step where a plating layer (6) is formed on at least either surface of each chip (10). COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005200727(A) 申请公布日期 2005.07.28
申请号 JP20040009833 申请日期 2004.01.16
申请人 TOYOTA MOTOR CORP 发明人 ONO HIROTAKA;BABA YOICHIRO
分类号 C23C18/16;C23C18/31;C25D7/12;C25D17/06;H01L21/78;(IPC1-7):C25D17/06 主分类号 C23C18/16
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