发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of efficiently manufacturing a semiconductor device with a thin sheet type semiconductor wafer accompanied by plating treatment as a base in such a manner that the failure of the thin sheet type wafer in the plating treatment is evaded. SOLUTION: The method of manufacturing each semiconductor device (10) provided with a plating layer (6) comprises: a step where a semiconductor wafer (5) in which a plurality of circuit patterns (2, 4) of the semiconductor device (10) are arranged on at least either side is prepared; a step where the wafer (5) is diced into a plurality of chips (10) each provided with the prescribed circuit patterns; and a step where a plating layer (6) is formed on at least either surface of each chip (10). COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005200727(A) |
申请公布日期 |
2005.07.28 |
申请号 |
JP20040009833 |
申请日期 |
2004.01.16 |
申请人 |
TOYOTA MOTOR CORP |
发明人 |
ONO HIROTAKA;BABA YOICHIRO |
分类号 |
C23C18/16;C23C18/31;C25D7/12;C25D17/06;H01L21/78;(IPC1-7):C25D17/06 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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