发明名称 METHOD OF PRODUCING A PLATE-SHAPED STRUCTURE, IN PARTICULAR, FROM SILICON, USE OF SAID METHOD AND PLATE-SHAPED STRUCTURE THUS PRODUCED, IN PARTICULAR FROM SILICON
摘要 The invention relates to a method of producing a plate-shaped structure and to the plate-shaped structure thus produced, in particular from silicon. The inventive structure comprises at least one substrate (2), a superstrate (3) and at least one intermediary layer (4) which is disposed between the substrate and the superstrate. The aforementioned intermediary layer (4) comprises at least one base material in which extrinsic molecules or atoms are distributed, which are different from the atoms or molecules of said base material. According to the invention, a heat treatment is applied to the plate such that, within the temperature range of said heat treatment, the intermediary layer (4) is plastically deformable and the presence of the selected extrinsic molecules or atoms in the selected base material causes the irreversible formation of micro-bubbles or micro-cavities (7) in said intermediary layer.
申请公布号 WO2005034218(A3) 申请公布日期 2005.07.28
申请号 WO2004FR02398 申请日期 2004.09.23
申请人 TRACIT TECHNOLOGIES;BRUEL, MICHEL 发明人 BRUEL, MICHEL
分类号 C30B33/00;C30B33/02;H01L21/20;H01L21/762 主分类号 C30B33/00
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