| 发明名称 |
COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME |
| 摘要 |
<p>Disclosed is a composition for forming an insulating film which contains a hydrolysis-condensation product obtained through hydrolysis-condensation of a silane monomer (A) containing a hydrolyzable group in the presence of a polycarbosilane (B) and a basic catalyst (C), and an organic solvent.</p> |
| 申请公布号 |
WO2005068540(A1) |
申请公布日期 |
2005.07.28 |
| 申请号 |
WO2005JP00374 |
申请日期 |
2005.01.14 |
| 申请人 |
JSR CORPORATION;NAKAGAWA, HISASHI;AKIYAMA, MASAHIRO;KUROSAWA, TAKAHIKO;SHIOTA, ATSUSHI |
发明人 |
NAKAGAWA, HISASHI;AKIYAMA, MASAHIRO;KUROSAWA, TAKAHIKO;SHIOTA, ATSUSHI |
| 分类号 |
C08G77/42;C08G77/48;C08L83/14;C09D183/14;H01B3/30;H01B3/46;H01L21/312;(IPC1-7):C08G77/48 |
主分类号 |
C08G77/42 |
| 代理机构 |
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