| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of stable substrate processing. <P>SOLUTION: The plasma processing apparatus has a processing container which has a holding base for holding a substrate to be processed, a microwave transmission window provided opposite to the substrate to be processed on the holding base, a microwave antenna provided opposite to the microwave transmission window and supplying a microwave into the processing container, and a microwave power source connected to the microwave antenna. Further, the plasma processing apparatus is equipped with an electric field measuring means for measuring the electric field intensity of the microwave supplied from the microwave antenna and a control means for controlling the microwave power source according to the electric field measured by the electric field measuring means. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
