| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive coloring composition which has an extremely high sensitivity and is capable of precisely forming a fine pattern in an exposure process for forming a pattern. <P>SOLUTION: The photosensitive coloring composition for solid-state imaging device color filter contains at least a reactive monomer, a photopolymerization initiator, a colorant and an organic solvent, wherein the photopolymerization initiator comprises a compound expressed by the formula (1). In the formula (1), each of R<SP>1</SP>to R<SP>14</SP>is independently either of hydrogen, hydroxyl group, amino group, carboxyl group, halogen, ketone group, aromatic group and aliphatic group. Therein, the aromatic group and aliphatic group preferably contain a structure selected from branched structure and alicyclic structure, preferably contain, in the way of the group, one or more kinds selected from ether bond, ester bond, amino bond, amide bond, thioether bond and unsaturated bond and preferably contain, on the terminal of the group, one or more kinds selected from hydroxyl group, amino group, carboxyl group, halogen, carbonyl group and aromatic group. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
