发明名称 DATA STRUCTURE, PLOTTING METHOD, PLOTTING APPARATUS, DEVICE AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a plotting method by which the impact accuracy of a droplet is improved by correcting the relative position between a discharge head and a substrate in the whole surface of the substrate and particularly a data structure or the like in which the load of a controller for determining a correction value is mitigated in deriving the correction value corresponding to the whole surface of the substrate. SOLUTION: In the data structure concerned with the impact accuracy of one or more droplets discharged from a discharge head, the data has one or more hierarchical structures of Dot, Line, Cell and Grid depending on a discharge step from the discharge head. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005199173(A) 申请公布日期 2005.07.28
申请号 JP20040007905 申请日期 2004.01.15
申请人 SEIKO EPSON CORP 发明人 NAGAE NOBUAKI
分类号 B41J2/01;B05C5/00;B05C11/00;B05D1/26;B05D7/00;B41J3/407;H05K3/10;(IPC1-7):B05C11/00 主分类号 B41J2/01
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