| 摘要 |
PROBLEM TO BE SOLVED: To effectively prevent a defocused exposure of a specific shot region caused by an erroneous detection of plane position information. SOLUTION: Before exposing a following shot after an exposure of a pre-shot on a wafer, a plurality of image luminous fluxes are respectively illuminated to an optical axis of a projection optical system from a direction with a predetermined inclined angle, in a region including the projection region of a mask pattern on the plane in the vicinity of the image of the projection optical system, and first plane position information of the wafer is obtained by receiving the reflected luminous flux at least one of the irradiation point of the plurality of image fluxes (step 111). The differenceΔZ between the second plane position information and first plane position information on the wafer required during the pre-shot exposure is compared with a predetermined threshold SZ (step 112). This comparison controls the position of the wafer so as to position the plane position of the wafer in the vicinity of the imaging surface of the projection optical system until a start of the exposure of the following shot when the difference exceeds the threshold. COPYRIGHT: (C)2005,JPO&NCIPI
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