发明名称 MULTIBEAM EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a multibeam exposure device which can detect the misregistration of respective beams emitted from the side of a means for selectively turning on/off a plurality of pixels and optical elements respectively corresponding thereto and can correct the same. SOLUTION: A microlens array 54 having respective microlenses 60 corresponding one to one to the respective light beams emitted from the means 36 for selectively turning on/off the plurality of pixels is two-dimensionally position adjustably supported by a micromovement adjusting means 66X(66Y). A control means 26 operates the amount of slippage of the relative positions from the information on the position of the specific pixel detected by a misregistration detecting means and the position of the wraparound pixel of the light beam existing around the specific pixel when the exposure surface is irradiated with the light beam through a microlens 60 when one specific pixel is turned on. The movement is adjusted to eliminate the slippage of the relative positions of the light beam of the one specific pixel and the microlens 60 corresponding to the light beam by controlling the driving of the movement adjusting means 66X and 66Y based on the results of the operation. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005202095(A) 申请公布日期 2005.07.28
申请号 JP20040007638 申请日期 2004.01.15
申请人 FUJI PHOTO FILM CO LTD 发明人 FUKUDA TSUYOSHI
分类号 G02B26/08;G03F7/20;(IPC1-7):G03F7/20 主分类号 G02B26/08
代理机构 代理人
主权项
地址